@Article{KostovBarr:2006:NuSiMa,
               author = "Kostov, Konstantin G. and Barroso, Joaquim Jos{\'e}",
          affiliation = "UNESP and {Instituto Nacional de Pesquisas Espaciais (INPE)}",
                title = "Numerical simulation of magnetic-field-enhanced plasma immersion 
                         ion implantation in cylindrical geometry",
              journal = "IEEE Transactions on Plasma Science",
                 year = "2006",
               volume = "34",
               number = "4",
                pages = "1127--1135",
                month = "Aug",
             keywords = "ion implantation, magnetic field effects, plasma materials 
                         processing applications, plasma sheaths, SHEATH THICKNESS, 
                         DISCHARGE, DYNAMICS, ELECTRONS, MODEL.",
             abstract = "Recent studies have demonstrated that the sheath dynamics in 
                         plasma immersion ion implantation (PIII) is significantly affected 
                         by an external magnetic field. In this paper, a two-dimensional 
                         computer simulation of a magnetic-field-enhanced PHI system is 
                         described. Negative bias voltage is applied to a cylindrical 
                         target located on the axis of a grounded vacuum chamber filled 
                         with uniform molecular nitrogen plasma. A static magnetic field is 
                         created by a small coil installed inside the target holder. The 
                         vacuum chamber is filled with background nitrogen gas to form a 
                         plasma in which collisions of electrons and neutrals are simulated 
                         by the Monte Carlo algorithm. It is found that a high-density 
                         plasma is formed around the target due to the intense background 
                         gas ionization by the magnetized electrons drifting in the crossed 
                         E x B fields. The effect of the magnetic field intensity, the 
                         target bias, and the gas pressure on the sheath dynamics and 
                         implantation current of the PHI system is investigated.",
           copyholder = "SID/SCD",
                 issn = "0093-3813",
             language = "en",
           targetfile = "Numerical simulation of magnetic field.pdf",
        urlaccessdate = "03 maio 2024"
}